Séminaire : Maxime Chambonneau : Taming nonlinear propagation of ultrashort laser pulses in silicon for devising innovative applications

Titre : Taming nonlinear propagation of ultrashort laser pulses in silicon for devising innovative applications

Résumé

In-volume ultrafast laser direct writing is a proven technique for tailoring the properties of dielectrics (e.g., glasses, polymers) in a three-dimensional, fast, and contactless way. Nevertheless, to date, this technique has no equivalent for silicon, which is the backbone of today’s semiconductor industry. The strong limitations preventing the material from the production of internal laser-induced permanent modifications originate from nonlinearities governing the propagation of ultrashort laser pulses in silicon. Solutions have been developed for remedy this issue, thus holding promises for countless applications such as contactless 3D integration of photonic and electronic circuits in monolithic silicon, ultrafast laser welding as well as wafer dicing.